New Photolithography Process

dragons_flight writes "Motorola has announced a new photolithography process capable of making chip features smaller than 100 nm, with the aim of eventually going as low as 13 nm. For reference, the current next-generation standard is 157 nm."

Scattered Angular Limiting Projection Electron

[javamark]

4 years ago I saw a v-expensive setup at LUCENT called SCALPEL, which stood for Scattered Angular Limiting Projection Electron Lithography, which uses high and low Z (atomic number) materials to pattern flood illuminate electron-photo-resists down to sub 30nm. The question now is how do you dope at such scales ? a.k.a Quantum doping