brings us this NetworkWorld article, which begins:
"In the ever-growing desire to produce smaller, less costly, yet more powerful and faster computers and storage devices, researchers today said they are looking at a way to
use self-growing fabrics that will let manufacturers build nano-sized high resolution semiconductors and arrays to answer that craving. Researchers at the Nanoscale Science and Engineering Center (NSEC) at the University of Wisconsin — Madison have come up with a method that uses existing technology to combine the lithography techniques traditionally used to pattern microelectronics with novel self-assembling materials known as block copolymers, researchers said. When combined with a lithographically patterned surface, the block copolymers' long molecular chains spontaneously assemble into the designated arrangements."